Low-Pressure Chemical Vapor Deposition of Cu−Pd Films: Alloy Growth Kinetics
- 1 December 1997
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 9 (12), 2822-2829
- https://doi.org/10.1021/cm970159j
Abstract
No abstract availableKeywords
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