Observations of sputtering damage using the field-ion microscope
- 1 October 1974
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 24 (10), 471-474
- https://doi.org/10.1016/0042-207x(74)90008-6
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- The occurrence of field-induced surface vacancies on iridium field-ion microscope specimensSurface Science, 1973
- The in situ cleaning of specimens in the field ion microscope by argon ion bombardmentSurface Science, 1973
- Surface damage and topography changes produced during sputteringRadiation Effects, 1973
- Alloy Sputtering Studies with in situ Auger Electron SpectroscopyJournal of Applied Physics, 1971
- ‘Bright spot’ images in field ion micrographs of irradiated tungstenPhilosophical Magazine, 1971
- FIELD-INDUCED SURFACE REARRANGEMENT IN A FIELD-ION MICROSCOPEApplied Physics Letters, 1970
- A field-ion microscope study of neutron irradiated iridiumPhilosophical Magazine, 1966
- Corrosion of Tungsten and Iridium by Field Desorption of Nitrogen and Carbon MonoxideThe Journal of Chemical Physics, 1963
- Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion BombardmentJournal of Applied Physics, 1962
- Application of the Ion Bombardment Cleaning Method to Titanium, Germanium, Silicon, and Nickel as Determined by Low-Energy Electron DiffractionJournal of Applied Physics, 1958