FIELD-INDUCED SURFACE REARRANGEMENT IN A FIELD-ION MICROSCOPE
- 1 September 1970
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 17 (5), 206-208
- https://doi.org/10.1063/1.1653367
Abstract
Adsorption of nitrogen on tungsten at 78°K was studied in a field‐ion microscope equipped with a channel‐plate image intensifier. Field‐induced surface rearrangement was observed using argon as the image gas. The changes in the field‐ion pattern are attributed to surface diffusion of tungsten‐nitrogen complexes.Keywords
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