Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge process
- 1 October 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 54 (1), 61-65
- https://doi.org/10.1016/0040-6090(78)90277-8
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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