Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 23 (4), 573-580
- https://doi.org/10.1109/27.467977
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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