Depth resolution in composition profiles by ion sputtering and surface analysis for single-layer and multilayer structures on real substrates
- 1 July 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 81 (3), 257-270
- https://doi.org/10.1016/0040-6090(81)90488-0
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- The statistical sputtering contribution to resolution in concentration-depth profilesThin Solid Films, 1981
- Quantitative depth profiling in surface analysis: A reviewSurface and Interface Analysis, 1980
- Deposition and characterization of thin SiOx filmsThin Solid Films, 1980
- A theoretical treatment of cascade mixing in depth profiling by sputteringPhysics Letters A, 1979
- The depth resolution of sputter profilingApplied Physics A, 1979
- Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solidsSurface and Interface Analysis, 1979
- Depth resolution in sputter profilingApplied Physics A, 1977
- Sputtering—a review of some recent experimental and theoretical aspectsApplied Physics A, 1975
- Computer simulation of atomic mixing during ion bombardmentApplied Physics A, 1975
- Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keVThe European Physical Journal A, 1973