Metal contact induced crystallization in films of amorphous silicon and germanium
- 1 May 1972
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 7 (4), 309-327
- https://doi.org/10.1016/0022-3093(72)90267-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The influence of contact materials on the conduction crystallization temperature and electrical properties of amorphous germanium, silicon and boron filmsThin Solid Films, 1970
- Effect of Deposited Metals on the Crystallization Temperature of Amorphous Germanium FilmJapanese Journal of Applied Physics, 1969