Laser photoablation processes in organosilane thin films
- 20 April 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 50 (16), 1041-1043
- https://doi.org/10.1063/1.97964
Abstract
We report on the excimer laser-induced photoablation of some organosilane polymers utilizing quartz microbalance techniques to monitor the nature of the ablation phenomenon. A fluence threshold for the ablation process is identified beyond which the material removal rate depends nonlinearly on the adsorbed laser fluence. Below this threshold, photo-oxidation of the polymer is observed as evidenced by mass uptake of the film. Our results suggest that photoablation of the polysilanes studied is a result of a combination of thermal and photochemical processes.Keywords
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