Exposure Atmosphere Effect on PGMA Negative Resist Crosslinking by AlKα X-Ray Exposure

Abstract

The crosslinking retardation of poly (glycidyl methacrylate) (PGMA) has been studied in AlKα X-ray lithography. The exposures were performed in a pressure-controlled exposure chamber, using a 10 kW Al source and polyimide masks. PGMA crosslinking is drastically retarded, as the pressure increases from 1 to 10⁴ Pa, by using the mask with a thin gold plating base. It is also shown that PGMA crosslinking is more markedly retarded with longer exposure time, when using this mask.