Ultraviolet‐Induced Deposition of SiO2 Film from Tetraethoxysilane Spin‐Coated on Si
- 1 June 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (6), 1556-1561
- https://doi.org/10.1149/1.2054961