Self-aligned porous silicon optical waveguides

Abstract

The authors report a new self-aligned method for the fabrication of porous silicon optical waveguides which is simple and avoids the typical processing problems associated with the chemically-reactive nature of the porous silicon internal surface. The method is compatible with high temperature oxidation, enabling waveguides operating between visible (633nm) and infra-red (1.3 µm) to be fabricated.