Generalized Ellipsometric Method for the Absorbing Substrate Covered with a Transparent-Film System Optical Constants of Silicon at 3655 Å*
- 1 January 1972
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America
- Vol. 62 (1), 16-23
- https://doi.org/10.1364/josa.62.000016
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 16 references indexed in Scilit:
- Multiple-Angle-of-Incidence Ellipsometry of Very Thin Films*Journal of the Optical Society of America, 1971
- Ellipsometric Technique for Obtaining Substrate Optical ConstantsJournal of Applied Physics, 1970
- Ellipsometric liquid immersion method for the determination of all the optical parameters of the system: Nonabsorbing film on an absorbing substrateSurface Science, 1969
- Error analysis of angle of incidence measurementsSurface Science, 1969
- Definitions and conventions in ellipsometrySurface Science, 1969
- Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate Optical Constants of Silicon*Journal of the Optical Society of America, 1969
- Optical Constants of Incandescent Refractory MetalsJournal of the Optical Society of America, 1966
- Interband Transitions in Groups 4, 3-5, and 2-6 SemiconductorsPhysical Review Letters, 1962
- Optical Constants of Silicon in the Region 1 to 10 evPhysical Review B, 1960
- Optical absorption in germaniumJournal of Physics and Chemistry of Solids, 1960