Spin‐Coatable Inorganic Resists Based on Novel Peroxopolyniobotungstic Acids for Bilayer Lithography
- 1 October 1987
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 134 (10), 2607-2613
- https://doi.org/10.1149/1.2100252