The oxidation of tantalum at 50–300°C
- 1 March 1958
- journal article
- Published by Elsevier in Acta Metallurgica
- Vol. 6 (3), 166-171
- https://doi.org/10.1016/0001-6160(58)90003-8
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Ionic Conductivity of Anodic Films at High Field Strengths: Transient BehaviorJournal of the Electrochemical Society, 1957
- The Question of Space Charge in Anodic Ta[sub 2]O[sub 5] FilmsJournal of the Electrochemical Society, 1957
- The rates of oxidation of several faces of a single crystal of copper as determined with elliptically polarized lightActa Metallurgica, 1956
- A Theory of the Kinetics of Formation of Anode Films at High FieldsJournal of the Electrochemical Society, 1955
- The effect of metal surface condition on the anodic oxidation of tantalumActa Metallurgica, 1954
- Formation of Anodic Oxide Films on CathodesJournal of the Electrochemical Society, 1954
- Low Temperature Oxidation of Copper. II. Reaction Rate Anisotropy1Journal of the American Chemical Society, 1951
- Low Temperature Oxidation of Copper. I. Physical Mechanism1aJournal of the American Chemical Society, 1950
- Theory of the oxidation of metalsReports on Progress in Physics, 1949
- Reactions of Zirconium, Titanium, Columbium, and Tantalum with the Gases, Oxygen, Nitrogen, and Hydrogen at Elevated TemperaturesJournal of the Electrochemical Society, 1949