Properties of TiNxfilms reactively sputtered in an argon-nitrogen atmosphere
- 1 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 62 (3), 347-351
- https://doi.org/10.1016/0040-6090(79)90009-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The Electrical Properties of Thin Films of TiNx and TiCxZeitschrift für Naturforschung A, 1975
- Reactively evaporated titanium nitride resistors for microcircuitsMicroelectronics Reliability, 1972
- Structure and Electrical Properties of Evaporated and Sputtered Titanium FilmsAnnalen der Physik, 1963