Low energy ECR plasma etching with a hybrid magnetic field
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4), 587-590
- https://doi.org/10.1016/0167-9317(90)90176-t
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Reactive Ion Beam Etching Using a Broad Beam ECR Ion SourceJapanese Journal of Applied Physics, 1982