Large refractive index change induced by ion implantation in lithium niobate
- 15 September 1974
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 25 (6), 329-331
- https://doi.org/10.1063/1.1655494
Abstract
Large but negative refractive index change (∼ 10% at 632.8‐nm line) is observed in several lithium niobate samples, each occurring in a thin layer induced by implantation of argon or neon ions. Implantation energy is 60 kV and the ion dose is 1016 cm−2 or more in each sample. Mechanisms causing the refractive index change and possible applications for integrated optics are discussed.Keywords
This publication has 9 references indexed in Scilit:
- Low-loss single-mode optical waveguides and efficient high-speed modulators of LiNbxTa1−xO3 on LiTaO3Applied Physics Letters, 1974
- Growth of LiNbO3 single-crystal film for optical waveguidesApplied Physics Letters, 1973
- Periodic structures in integrated opticsJournal of Applied Physics, 1973
- Effect of 80-keV Ne+ ion implantation on acoustic surface wave attenuation in LiNbO3Applied Physics Letters, 1973
- Coupled-mode analysis of periodic dielectric waveguidesOptics Communications, 1973
- Analysis of optical propagation in a corrugated dielectric waveguideOptics Communications, 1973
- Optical waveguiding layers in LiNbO3 and LiTaO3Applied Physics Letters, 1973
- Quartz optical waveguide by ion implantationApplied Physics Letters, 1973
- Ferroelectricity in the Ilmenite StructurePhysical Review B, 1952