Heteroepitaxy of a deposited amorphous germanium layer on a silicon substrate by laser annealing
- 1 February 1979
- journal article
- other
- Published by Elsevier in Thin Solid Films
- Vol. 57 (1), L13-L15
- https://doi.org/10.1016/0040-6090(79)90435-8
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Heteroepitaxy of deposited amorphous layer by pulsed electron-beam irradiationApplied Physics Letters, 1978
- Dechanneling of fast particles by lattice defectsJournal of Nuclear Materials, 1974