Chemical vapour deposition of TiO2 film using an organometallic process and its photoelectrochemical behaviour

Abstract

Vapour pyrolysis of ethyl titanate has been performed in order to obtain thin TiO₂ films. A selective deposition of rutile films is found to occur when substrate temperatures are below 500°C and the gas phase has a large linear velocity. The physical properties of the as-grown films, including their photoelectrochemical behaviour, are examined in relation to their condition of deposition. A thick rutile film grown on a Ti plate converts light energy to electricity with good quantum efficiency in a photoelectrochemical cell.