Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

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1 January 1999

journal article
research article
Published by Wiley in Chemical Vapor Deposition

Vol. 5 (1), 7-9
https://doi.org/10.1002/(sici)1521-3862(199901)5:1<7::aid-cvde7>3.0.co;2-j

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Cited by 259 articles