Auger study of Cr/Au thin films deposited on alumina and sapphire
- 1 September 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (1), 143-150
- https://doi.org/10.1016/0040-6090(80)90567-2
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Interfacial behavior of Cr–Au films in the 423–573-K temperature rangeJournal of Vacuum Science and Technology, 1979
- Quantitative auger electron analysis of homogeneous binary alloys: Chromium in goldSurface Science, 1977
- Analysis of grain-boundary diffusion in thin films: Chromium in goldJournal of Applied Physics, 1976
- Thin-film interdiffusion. I. Au-Pd, Pd-Au, Ti-Pd, Ti-Au, Ti-Pd-Au, and Ti-Au-PdJournal of Applied Physics, 1975
- Diffusion measurements in thin films utilizing work function changes: Cr into AuJournal of Applied Physics, 1972
- Interdiffusion in thin conductor films — chromium/gold, nickel/gold and chromium silicide/goldMetallurgical Transactions, 1971
- Grain Boundary Diffusion Effects in Films of Gold on ChromiumNature, 1968
- The analysis of grain boundary diffusion measurementsBritish Journal of Applied Physics, 1963
- Grain Boundary and Lattice Diffusion in Polycrystalline BodiesJournal of Applied Physics, 1960
- CXXXVIII. Concentration contours in grain boundary diffusionJournal of Computers in Education, 1954