A UHV microarea Auger analysis system that has submicron Auger analysis capability is described. Capabilities of this versatile surface research system include secondary electron imaging, microarea Auger analysis in both E d N/d E and E N (E) modes, macroarea AES, sputter ion cleaning, and a multiple specimen handling facility. A thermal field emission Zr/W(100) source is used for microarea AES. A spatial resolution of 1000 Å in the secondary electron image is demonstrated. Auger line scans in both E d N/d E and E N (E) modes show submicron edge resolution under nonideal specimen conditions.