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Stability of SiC-masks for high resolution synchrotron X-ray lithography
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Stability of SiC-masks for high resolution synchrotron X-ray lithography
Stability of SiC-masks for high resolution synchrotron X-ray lithography
HL
H. Lüthje
H. Lüthje
UM
U. Mackens
U. Mackens
UM
U. Mescheder
U. Mescheder
BM
B. Mathhieβen
B. Mathhieβen
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31 December 1986
journal article
Published by
Elsevier
in
Microelectronic Engineering
Vol. 5
(1-4)
,
39
https://doi.org/10.1016/0167-9317(86)90027-4
Abstract
No abstract available
Keywords
SYNCHROTRON X
HIGH RESOLUTION
RESOLUTION SYNCHROTRON
RAY LITHOGRAPHY
SIC MASKS
STABILITY OF SIC
Cited by 1 article