Application of X-ray Photoelectron Spectroscopy to the Study of Fly Ash
- 1 May 1978
- journal article
- Published by SAGE Publications in Applied Spectroscopy
- Vol. 32 (3), 316-319
- https://doi.org/10.1366/000370278774331378
Abstract
X-ray photoelectron spectroscopy has been used to identify and determine the oxidation states of a number of major and minor elements present on the surface of fly ash particles. With the use of a sputtering-etching procedure, relative concentrations as a function of depth were obtained for Si, Al, Fe, Ca, Na, C, O, and S. The concentrations of Na, C, O, and S were found to decrease and Si, Al, and Fe were found to increase upon sputtering to a depth of approximately 50 Å.Keywords
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