Abstract
Fully automatic computer simulation of random-network structures in amorphous Si and Ge has been achieved using a generalization of Keating's potential. The local potential for one-atom displacements shows many multiple minima with broad distributions of the energy difference and tunneling matrix element. These distributions lead to reasonable estimates for the specific heat, which behaves as TlnT. One-atom tunneling states appear to be appropriate for amorphous Si/Ge.