Condensation coefficients in metal vapour deposition
- 1 December 1973
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine
- Vol. 28 (6), 1419-1423
- https://doi.org/10.1080/14786437308228011
Abstract
A method of examining electron micrographs of metal deposits is discussed, which allows the determination of the integrated condensation coefficient on selected areas of surface of known structure. The method is suitable for deposits of average thickness up to about 20 A. Some experimental values are presented for the deposition of gold onto atomically flat regions of UHV cleaved alkali halide crystal surfaces. The relative influence of coverage, atom arrival rate, substrate temperature and step structure of the surface is indicated, and the measured values are compared with theoretically predicted values.Keywords
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