Synthesis of Highly Photosensitive a-SiC:H Films at High Deposition Rate by Plasma Decomposition of SiH4 and C2H2
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- High-rate deposition of photosensitive a-SiC:H using a carbon source of C2H2Journal of Non-Crystalline Solids, 1987
- Properties and Local Structure of Plasma-Deposited Amorphous Silicon-Carbon AlloysMRS Proceedings, 1986
- Laser photolysis of C2H2 and CF3C2H at 193 nm: Production of C2(d3Πg and CH(A2Δ) and their quenching by XeChemical Physics, 1985
- Fundamental mechanisms in silane plasma decompositions and amorphous silicon depositionJournal of Non-Crystalline Solids, 1983