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Tungsten silicide/titanium nitride compound gate for submicron CMOSFET
Home
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Tungsten silicide/titanium nitride compound gate for submicron CMOSFET
Tungsten silicide/titanium nitride compound gate for submicron CMOSFET
KK
K.T. Kim
K.T. Kim
LK
L.G. Kang
L.G. Kang
TP
T.S. Park
T.S. Park
YS
Y.S. Shin
Y.S. Shin
JP
J.K. Park
J.K. Park
CL
C.J. Lee
C.J. Lee
CH
C.G. Hwang
C.G. Hwang
DC
D. Chin
D. Chin
YP
Y.E. Park
Y.E. Park
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1 January 1990
proceedings article
Published by
Institute of Electrical and Electronics Engineers (IEEE)
https://doi.org/10.1109/vlsit.1990.111035
Abstract
No abstract available
Keywords
SUBMICRON
GATE
CMOSFET
SILICIDE/TITANIUM NITRIDE COMPOUND
TUNGSTEN SILICIDE/TITANIUM
Cited by 11 articles