Low energy rf sputtering system for the deposition of ITO thin films
- 1 June 1999
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 44 (21-22), 3927-3932
- https://doi.org/10.1016/s0013-4686(99)00100-0
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
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