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Polymer Resist Systems for Photo- And Electron Lithography
Home
Publications
Polymer Resist Systems for Photo- And Electron Lithography
Polymer Resist Systems for Photo- And Electron Lithography
LT
L F Thompson
L F Thompson
RK
R E Kerwin
R E Kerwin
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1 August 1976
journal article
Published by
Annual Reviews
in
Annual Review of Materials Science
Vol. 6
(1)
,
267-301
https://doi.org/10.1146/annurev.ms.06.080176.001411
Abstract
No abstract available
Keywords
ELECTRON LITHOGRAPHY
POLYMER RESIST
RESIST SYSTEMS
PHOTO AND ELECTRON
SYSTEMS FOR PHOTO
Cited by 64 articles