X-ray studies of SnO2 prepared by chemical vapour deposition
- 1 August 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 141 (2), 287-295
- https://doi.org/10.1016/0040-6090(86)90356-1
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Crystallographic Orientation and Surface Morphology of Chemical Vapor Deposited Al2 O 3Journal of the Electrochemical Society, 1983
- Effect of deposition parameters on the microstructure of chemically vapour-deposited SnO2 filmsThin Solid Films, 1983
- Chemical vapour deposition of tin oxide films and their electrical propertiesJournal of Physics D: Applied Physics, 1981
- A thermodynamic analysis of the deposition of SnO2 thin films from the vapor phaseThin Solid Films, 1979
- A new CVD technique for the preparation of transparent conducting filmsSurface Science, 1979
- Mechanism of CVD Thin Film SnO2 FormationJournal of the Electrochemical Society, 1978
- Physical Properties of SnO2 Materials: I . Preparation and Defect StructureJournal of the Electrochemical Society, 1976
- Chemical Vapor Deposition of Antimony‐Doped Tin Oxide Films Formed from Dibutyl Tin DiacetateJournal of the Electrochemical Society, 1976
- Structure/property/process relationships in chemical vapor deposition CVDJournal of Vacuum Science and Technology, 1974
- Preparation of Thick Crystalline Films of Tin Oxide and Porous Glass Partially Filled with Tin OxideJournal of the Electrochemical Society, 1969