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Etching corundum with silicon
Home
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Etching corundum with silicon
Etching corundum with silicon
FR
F. H. Reynolds
F. H. Reynolds
AE
A. B. M. Elliot
A. B. M. Elliot
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1 May 1966
journal article
other
Published by
Taylor & Francis
in
Philosophical Magazine
Vol. 13
(125)
,
1073-1074
https://doi.org/10.1080/14786436608213155
Abstract
If the rate of deposition of silicon on corundum
in vacuo
is sufficiently low, substantial etching of the corundum occurs at temperatures where the epitaxial deposition of silicon was expected.
Keywords
SILICON
EPITAXIAL DEPOSITION
VACUO
SUFFICIENTLY LOW
CORUNDUM OCCURS
SUBSTANTIAL ETCHING
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Cited by 6 articles