Cross‐Sectional Transmission Electron Microscopy For Polycrystalline Silicon Films
- 1 January 1980
- journal article
- Published by Wiley in Journal of Microscopy
- Vol. 118 (1), 97-103
- https://doi.org/10.1111/j.1365-2818.1980.tb00251.x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Investigation of polycrystalline silicon layers by electron microscopy and x-ray diffractionSolid-State Electronics, 1975
- Structures of Si Films Chemically Vapor-Deposited on Amorphous SiO2SubstratesJapanese Journal of Applied Physics, 1975
- Chemically Vapor Deposited Polycrystalline-Silicon FilmsIEEE Transactions on Parts, Hybrids, and Packaging, 1974
- Microstructural Analysis of Evaporated and Pyrolytic Silicon Thin FilmsJournal of the Electrochemical Society, 1973