Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles
- 1 January 1993
- journal article
- Published by Wiley in Journal of Polymer Science Part A: Polymer Chemistry
- Vol. 31 (1), 1-11
- https://doi.org/10.1002/pola.1993.080310101
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Design and synthesis of thermally labile polymers for microelectronics: poly(vinyl tert-butyl carbonate sulfone)Macromolecules, 1991
- Chemical amplification mechanisms for microlithographyChemistry of Materials, 1991
- Chemically amplified imaging materials based on electrophilic aromatic substitution: poly[4-(acetoxymethyl)styrene-co-4-hydroxystyrene]Macromolecules, 1991
- Design of polymeric imaging materials based on electrophilic aromatic substitution: model studiesMacromolecules, 1991
- Photogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitutionJournal of Materials Chemistry, 1991
- Chemically amplified imaging materials based on acid-catalyzed reactions of polyesters or electrophilic crosslinking processes.Journal of Photopolymer Science and Technology, 1990
- Triphenylsulfonium salt photochemistry. New evidence for triplet excited state reactionsThe Journal of Organic Chemistry, 1988
- Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resinsPolymer, 1983
- Photoinitiated cationic polymerization with triarylsulfonium saltsJournal of Polymer Science: Polymer Chemistry Edition, 1979
- Notiz über neue Methylol‐benzoleEuropean Journal of Inorganic Chemistry, 1954