The growth of diamond using halogenated methane
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4), 311-316
- https://doi.org/10.1016/0925-9635(93)90073-b
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Optical properties of chemical-vapor-deposited diamond filmsJournal of Materials Research, 1990
- Growth of Diamond Thin Films by dc Plasma Chemical Vapor Deposition and Characteristics of the PlasmaJapanese Journal of Applied Physics, 1990
- Homogeneous nucleation of diamond powder in the gas phaseJournal of Applied Physics, 1989
- Electrical Characteristics of Metal Contacts to Boron-Doped Diamond Epitaxial FilmJapanese Journal of Applied Physics, 1989
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989
- Diamond Films Synthesized by Microwave Plasma CVD of Ethyl Alcohol, etc.Japanese Journal of Applied Physics, 1988
- Crystallization of diamond crystals and films by microwave assisted CVD (Part II)Materials Research Bulletin, 1988
- Epitaxial growth mechanism of diamond crystal in methane-hydrogen plasmaJournal of the American Chemical Society, 1986
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982
- Raman efficiency measurements of graphitePhysica B+C, 1981