In addition to the technical and political problems associated with the safe handling of phosphine, arsine, and other binary hydrides, there are performance drawbacks to the use of these hydrides in wafer processing for semiconductor manufacturing. The metalic arganic organic chemical vapor deposition reagent program at American Cyanamid has explored whether new sources can offer better solutions to existing problems than continued efforts to work with existing materials. Our studies of new phosphorus and arsenic sources are briefly described in this paper. (AIP)