Formulation for XPS spectral change of oxides by ion bombardment as a function of sputtering time
- 1 May 2004
- journal article
- Published by Elsevier in Surface Science
- Vol. 556 (1), 22-32
- https://doi.org/10.1016/j.susc.2004.03.002
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Alteration of Ti 2p XPS spectrum for titanium oxide by low‐energy Ar ion bombardmentSurface and Interface Analysis, 2002
- Alternation of Ti 2p XPS Spectrum for TiO2 by Ar Ion BombardmentJournal of Surface Analysis, 2002
- PSA-01 (Practical Surface Analysis 2001)Hyomen Kagaku, 2002
- Unintended Degradation of Organic Specimens during Measurements. (1). X-ray Photoelectron Spectroscopy of Nitrocellulose-Celluloseacetate Specimen and Discussions Using the Rate Constants for N 1s Photoemission.Hyomen Kagaku, 1999
- Sputtering yield formula for B4C irradiated with monoenergetic ions at normal incidenceJournal of Nuclear Materials, 1996
- Correction of Peak Shift and Classification of Change of X‐ray Photoelectron Spectra of Oxides as a Result of Ion SputteringSurface and Interface Analysis, 1992
- Measurement of ion sputtering yields for depth profile analysesSurface and Interface Analysis, 1992
- Ion-irradiation effects on the phonon correlation length of graphite studied by Raman spectroscopyPhysical Review B, 1992
- Electron beam damage in Auger electron spectroscopyApplications of Surface Science, 1981
- Beam effects in Auger electron spectroscopy analysis of titanium oxide filmsJournal of Vacuum Science and Technology, 1977