Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
- 1 January 1995
- journal article
- Published by Elsevier in Surface Science
- Vol. 322 (1-3), 230-242
- https://doi.org/10.1016/0039-6028(95)90033-0
Abstract
No abstract availableKeywords
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