Modeling projection printing of positive photoresists
- 1 July 1975
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 22 (7), 456-464
- https://doi.org/10.1109/t-ed.1975.18161
Abstract
The accompanying papers "Optical Lithography" and "Characterization of Positive Photoresist" introduce the concepts of modeling using destruction of the photoactive inhibitor compound to describe exposure and a surface-limited removal rate to describe development together with the optical exposure parameters A, B, and C and a rate relationship, R(M), which characterize the photoresist for modeling purposes. This paper applies the model to, the projection exposure environment: exposure and development of photoresist are treated with a simulation model that allows computation of image surface profiles for positive photoresist exposed with a diffraction limited real image.Keywords
This publication has 3 references indexed in Scilit:
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- High Performance Reduction Lenses for Microelectronic Circuit FabricationIBM Journal of Research and Development, 1969
- A programming languagePublished by Association for Computing Machinery (ACM) ,1962