Effect of oxygen on orientation of polycrystalline Fe films prepared by ECR-magnetron sputtering
- 15 April 1991
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 69 (8), 5673-5675
- https://doi.org/10.1063/1.347932
Abstract
An ECR-magnetron sputtering system with permanent magnets has been developed and used to prepare Fe-O films. Oxygen was introduced into an Ar sputtering atmosphere during deposition of Fe onto the glass substrate. X-ray diffraction patterns of these films showed a drastic increase in intensity of the Fe(200) diffraction peak, and a rapid decrease of the Fe(110) peak. The Fe(110) single peak is observed in the film prepared without oxygen. In the films prepared with oxygen, iron oxides were not detected through x-ray diffraction, x-ray photoelectron, or magnetic properties measurements, implying that, in sputter-deposited Fe films, a small amount of oxygen brings about a [100] orientation of the Fe grains.Keywords
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