Comparison of microwave and lower frequency plasmas for thin film deposition and etching

Publisher Website

1 November 1985

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology A

Vol. 3 (6), 2643-2649
https://doi.org/10.1116/1.572805

Abstract

No abstract available

Keywords

THIN FILM DEPOSITION

Cited by 108 articles