Formation of CN− radicals by sequential implantation of carbon and nitrogen ions into KCl
- 1 May 1982
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (5), 3529-3535
- https://doi.org/10.1063/1.331176
Abstract
It is shown that the sequential implantation of 20–200 keV C+ and N+ ions into a KCl crystal gives rise to formation of the CN− molecular configuration. Detection of the CN− is by the characteristic luminescence spectrum induced when He+ ions are incident on the implanted target, a technique which represents a direct in situ determination of their presence. It is shown how the ion‐induced optical emission may be used to provide a routine relative measurement of the quantity of CN− present. We describe a phenomenological model of the formation process which leads to the conclusion that each incoming ion searches a volume of the target approximately 3.4×10−21 cm3 in extent and has a unit probability of combining with an atom of the other species lying in this region. This model explains why saturation of the CN− density occurs at a N+ dose independent of the quantity of C+ implanted previously.Keywords
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