Organosilane self‐assembled monolayers formed at the vapour/solid interface
- 1 August 2002
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 34 (1), 550-554
- https://doi.org/10.1002/sia.1358
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Trialkylsilane Monolayers Covalently Attached to Silicon Surfaces: Wettability Studies Indicating that Molecular Topography Contributes to Contact Angle HysteresisLangmuir, 1999
- Vapor Phase Self-Assembly of Fluorinated Monolayers on Silicon and Germanium OxideLangmuir, 1997
- Organosilane Monolayer Resists for Scanning Probe Lithography.Journal of Photopolymer Science and Technology, 1997
- Effects of Chemical Vapor Surface Modification of Glass Air Filter with Fluoroalkylsilane on Its Particle Trapping EfficiencyJournal of the Electrochemical Society, 1995
- Degradation of a Trimethylsilyl Monolayer on Silicon Substrates Induced by Scanning Probe AnodizationLangmuir, 1995
- Chemical Vapor Surface Modification of Porous Glass with Fluoroalkyl-Functionalized Silanes. 2. Resistance to WaterLangmuir, 1995
- Surface Reaction of Fluoroalkyl‐Functional Silanes on SnO2Journal of the Electrochemical Society, 1995
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- Chemical vapour deposition of silanesThin Solid Films, 1985
- Organized monolayers by adsorption. 1. Formation and structure of oleophobic mixed monolayers on solid surfacesJournal of the American Chemical Society, 1980