Interface Formation during Thin Film Deposition
- 1 August 1963
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 34 (8), 2493-2494
- https://doi.org/10.1063/1.1702776
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Threshold Energies in Mechanical Collision Theories of Cathode SputteringJournal of Applied Physics, 1962
- THE RANGE OF ALKALI METAL IONS OF KILOELECTRON VOLT ENERGIES IN ALUMINUMCanadian Journal of Chemistry, 1960
- Velocities of Sputtered AtomsPhysical Review B, 1959
- Deposition of Atomic BeamsReviews of Modern Physics, 1958
- Simple, Rapid Sputtering ApparatusReview of Scientific Instruments, 1956