The annealing of phosphorus-ion-implanted cadmium telluride by a pulsed electron beam
- 1 November 1985
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 32 (11), 2297-2300
- https://doi.org/10.1109/t-ed.1985.22273