Wafer quality specification for future sub-half-micron ULSI devices

Publisher Website

2 January 2003

proceedings article
Published by Institute of Electrical and Electronics Engineers (IEEE)

p. 24-25
https://doi.org/10.1109/vlsit.1992.200626

Abstract

No abstract available

Keywords

This publication has 1 reference indexed in Scilit:

Time-dependent-dielectric breakdown of thin thermally grown SiO₂films
IEEE Transactions on Electron Devices, 1985

Cited by 3 articles