Nanostructure array fabrication with a size-controllable natural lithography
- 17 November 1997
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (20), 2934-2936
- https://doi.org/10.1063/1.120220
Abstract
A simple technique for size-controllable nanostructure array formation has been developed, using self-assembled polystyrene beads whose diameters can be arbitrarily reduced by reactive ion etching. We have produced a hole array of 83 and 157 nm diameter with 200 nm pitch on Si substrate. This technique can find potential applications in many areas of science and technology.Keywords
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