Self-diffusion in copper between 359 and 632°C
- 13 August 1973
- journal article
- Published by Elsevier in Physics Letters A
- Vol. 44 (7), 539-540
- https://doi.org/10.1016/0375-9601(73)91012-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The Production of Plane Surfaces on Single Crystals of Copper and Copper AlloysReview of Scientific Instruments, 1970
- Isotope Effect and Divacancies for Self‐Diffusion in CopperPhysica Status Solidi (b), 1969
- Interpretation of Self‐Diffusion and Vacancy Properties in CopperPhysica Status Solidi (b), 1969
- Growth of Copper Crystals of Low Dislocation DensityJournal of Applied Physics, 1964
- Measurement of Equilibrium Concentrations of Vacancies in CopperPhysical Review B, 1963