Diffusion of phosphorus in silicon oxide film
- 1 October 1959
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 11 (3-4), 288-298
- https://doi.org/10.1016/0022-3697(59)90229-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Kinetics of the Oxidation and Nitridation of Silicon at High TemperaturesThe Journal of Physical Chemistry, 1958
- Evaluation of the Surface Concentration of Diffused Layers in SiliconBell System Technical Journal, 1958
- The High Temperature Oxidation of SiliconThe Journal of Physical Chemistry, 1957
- Surface Protection and Selective Masking during Diffusion in SiliconJournal of the Electrochemical Society, 1957