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Etching of fused silica and glass with excimer laser at 351 nm
Home
Publications
Etching of fused silica and glass with excimer laser at 351 nm
Etching of fused silica and glass with excimer laser at 351 nm
K. Zimmer
K. Zimmer
AB
A. Braun
A. Braun
RB
R. Böhme
R. Böhme
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15 March 2003
journal article
Published by
Elsevier
in
Applied Surface Science
Vol. 208-209
,
199-204
https://doi.org/10.1016/s0169-4332(02)01372-7
Abstract
No abstract available
Keywords
81.65.C
81.05.K
79.20.D
61.80.B
42.62.C
42.55.L
EXCIMER LASER
LASER ETCHING
GLASS
LIQUID INTERFACE
Cited by 49 articles